Silicon Wafer Pre-clean & De-glue Station

The innovative technology behind the Edwards
wafer pre-cleaning station ensures consistently high throughput coupled with optimum cleaning results & helps to minimise environmental impact

Using our extensive experience from the last 30 years in the semiconductor, microelectronics and Photovoltaic fields, we have designed a silicon wafer block pre-cleaning and de-gluing system that has been proven to be reliable and cost effective.

Designed using the latest 2D & 3D CAD software, our pre-clean & de-glue stations are designed to run 24 hours a day, 365 days a year, with uptime greater than 95%.

Capable of handling a total block length of up to 2000mm per bath with a max individual block length of 500mm. Numerous block size configurations are possible. Where consistent loading intervals are not possible, a twin robot version is available that improves repeatability of the batch cycle times

Our environmentally friendly technology helps toward the reduction of chemicals used and the reuse of process water helps reduce even further the impact of the process upon the environment.

• Throughput:-

up to 8,700 wafers/hour for 2000mm load capacity machine
up to 4,300 wafers/hour for 1000mm load capacity machine

• Typical process water consumption:-       

5.8 m³/h* (2000mm load capacity machine)
3.4 m³/h* (1000mm load capacity machine)

• Accommodates from 125mm x 125mm up to 156mm x 156mm wafers
• Three pre-wash baths, one de-glue bath and final rinse bath
• Ultra sonic agitation in first three baths with option of three frequencies settable
• De-Glue bath chemical concentration constantly monitored and displayed on HMI
• Fully customisable recipes for each bath
• Left ® Right or Right ® Left product flow direction
• ‘on-board’ OPC server for easy connection to factory data collection systems

* based on machines processing 156mm 180 µm wafers by 240mm blocks and are for guidance only and are wholly dependant upon specific machine configuration and recipe formulation